Makogon Yu.M.

Influence of Annealing Conditions on Structure and Magnetic Properties of Nanodimensional Fe50Pt50(15 nm)/ Ag(30 nm)/Fe50Pt50(15 nm)/SiO2(100 nm)/Si(001) Film Composition

We study the influence of 30-nm-thick Ag intermediate layer and annealing duration in a vacuum at the temperature of 600 °С on formation of chemically ordered L10(FePt) phase in nanodimensional film composition (NFC) of Fe50Pt50(15 nm)/Ag(30 nm) /Fe50Pt50(15 nm) on planar SiO2(100 nm)/Si(001) substrate.

Influence of Annealing Temperature on Structure and Magnetic Properties of Nanodimensional Fe50Pt50(15 нм)/ Ag(30 нм)/Fe50Pt50(15 нм)/SiO2(100 нм)/Si(001) Film Composition

We study the influence of annealing temperature in range of 300–900 °С and intermediate Ag layer on processes of diffusional phase formation and transition of chemically disordered magnetic-soft А1(FePt)FCC phase to chemically ordered magnetic-hard L10(FePt)FCT phase in nanodimensional Fe50Pt50(15 nm)/Ag(30 nm)/Fe50Pt50(15 nm) film composition (NFC) on SiO2(100 nm)/Si(001) substrate. We investigate its structure, morphology and magnetic properties. We show that after deposition in NFC under study the phase А1(FePt)FCC is observed.

Ferromagnetic Resonance in Nanoscaled Fe-Pt Films

The paper under scrutiny studies the influence of phase composition and structure of nanoscaled 10 and 30 nm FePt films on their magnetic properties, specifically on the shape change of ferromagnetic resonance (FMR) lines. The films are deposited on substrate of thermally oxidated (100 nm thick SiO2) monocrystalline Si with orientation of (001). Samples annealings are carried out in the vacuum of ∼1,3⋅10 −3∼1 Pа in the temperature range of 100–900 °С for 30 s at each temperature. FMR lines are obtained in magnetic field applied in the film plane after annealing at different temperatures.

The Influence of Annealing Conditions on Structure and Magnetic Properties of Nanodimensional Fe50Pt50 Film on Planar SiO2(100 nm)/Si(100) Substrates

It is studied the influence of annealing conditions in temperature range of 300– 900 °С on formation of magnetic-ordered L10(FePt) phase in nanodimensional Fe50Pt50(15 nm) /Ag(3 nm)/Fe50Pt50(15 nm) film composition (NFC) on planar SiO2(100 nm)/Si(100) substrate. It is investigated its structure, morphology and magnetic properties. It is shown that the formation of L10(FePt) phase occurs at annealing 700 °С for 30 s and heating rate of 5 °С/s. Amount of L10(FePt) phase increases with increase of annealing temperature.

The Influence of Annealing Conditions on Structure and Magnetic Properties of Nanodimensional Fe50Pt50 Film on Planar SiO2(100 nm)/Si(100) Substrates

In this paper, we study the influence of 3-nm-thick Ag intermediate layer and annealing duration in a vacuum at the temperature of 600°С on formation of chemically ordered L10(FePt) phase in the nanodimensional film composition (NFC) of Fe50Pt50(15 nm)/Ag(3 нм)/ Fe50Pt50(15 nm) on the planar SiO2(100 нм)/Si(100). substrate. Its structure and magnetic properties are investigated. We show that the formation of L10(FePt) phase takes place during annealing whose duration is 30 мин. min.

The phase formation in Ti(200 нм)/Cu(200 нм)/Ti(100 нм)/SiO[sub]2[/sub](370 нм) film composition on the monocrystalline silicon (001)

Using the methods of X-ray diffraction, scanning electron microscopy and resistometry measurements, we investigated the solid-state reactions in the Ti(200 nm)/Cu(200 nm)/Ti(100 nm)/SiO2(370nm) multilayered film composition on the monocrystaline silicon of (001) orientation. We obtained the film composition by the consecutive electron-beam deposition of the element layers in vacuum of about 10-4 Pa without breaking vacuum on the silicon substrate with the oxide layer, which was grown by wet oxidation on the surface.

The influence of the annealings on the phase formation in [Ta(3,3 нм)/Si(6,6 нм)][sub]45[/sub]/Si (001) multilayer film composition and its optical properties

Employing the methods of spectroscopic ellipsometry, X-ray phase analysis and resistometry, we study the influence of heat treatment on the phase formation in periodic (45 bilayers) [Ta(3,3 нм)/ Si(6,6 нм)]45/ Si(001) multilayered film composition (MFC) with middle volume composition of TaSi2. Through experiments performed, we determine the regularities of change of the optical properties and energetic spectra of electrons as a result of translation symmetry loss in tantalum disilicide.

Formation of phase composition and structure in nanosize thin film compositions CoSb([sub]1,82–2,51[/sub])(30 нм)/SiO[sub]2[/sub](100 нм)/ Si(001) – functional elements of thermionics

By the methods of x-ray photography diffraction, scanning electron microscopy, atomic-power microscopy and resistometry, we investigate the processes of phase formation and structure in CoSb(1,82–2,51)(30 nm) thin film on the single-crystal silicon of Si(001) substrate with the SiO2(100 nm) oxide layer.

The Solid-State Reactions in Ti(200 nm)/Cu(200 nm)/Ti(100 nm)/SiO2(370 nm) Film Composition on the Monocrystalline Silicon (001)

By employing the methods of X-ray diffraction, transmission electron microscopy of cross-sections, scanning electron microscopy and resistometry measurements, we examine the solid-state reactions in the Ti(200 nm)/Cu(200nm)/Ti(10nm)/SiO2(370nm) film composition on the mono¬crystaline silicon of (001) orientation. The film composition under study is obtained by consecutive electron-beam deposition of elements layers in a vacuum of about 104 Pa without breaking a vacuum on the substrate of silicon with an oxide layer on the surface.

Phase transformations and physical зroperties of nanodimensional fe50pt50 (30 nm)/sio2(100 nm)/si(001) film system

In this paper, we study conditions of the magnetically ordered L10(FePt) phase with a face-centered tetragonal lattice in the nanodimensional Fe50Pt50 (30 nm)/SiO2(100 nm)/Si(001) film system at annealing in nitrogen. We also investigate its structure, morphology, electric and magnetic properties. On the experimental side, we show that the magnetically ordered L10(FePt) phase with rectangular grains is formed in Fe50Pt50 films after annealing at 720 K.